Nov 12 2008

Leading Semiconductor Companies Look to Dassault Systèmes to Improve Design Collaboration and Management

Gantry Group Survey Finds Dassault Systèmes ENOVIA Helps Companies Meet Industry Challenges by Managing Multi-Site Design, Improving Productivity and Maximizing IP Re-use

LOWELL, MA – November 12, 2008 – Dassault Systèmes (DS) (Euronext Paris: #13065, DSY.PA), a world leader in 3D and Product Lifecycle Management (PLM) solutions announced a new white paper from the Gantry Group which found that semiconductor companies using ENOVIA PLM solutions reported a number of clear benefits including a 74% increase in multi-site designs, a 46% savings in design engineering time and a 32% increase in product quality.

The study conducted by the Gantry Group, a technology research and ROI analysis company, entitled ROI Impact Analysis of ENOVIA Synchronicity DesignSync Data Manager, was based on a series of in-depth interviews with more than 15 of the top semiconductor companies who have deployed the ENOVIA Synchronicity DesignSync Data Manager solution.

“In today’s economy, semiconductor companies cannot afford to waste time and money on an extensive, error-filled production process, nor can they afford to miss the small window they have to get new products out to market,” said Rick Stanton, Director, Global Semiconductor Strategy & Solutions ENOVIA R&D, Dassault Systèmes.  “The cost and timing pressures to ‘get it right the first time’ highlighted in the Gantry white paper demonstrate exactly why it is so important to have a strong collaboration and design management tool in place.”

ENOVIA Synchronicity DesignSync enables semiconductor companies to streamline business processes and reduce new product development time through one cohesive source of information that allows management and collaboration of design information, as well as visibility into the development process of each and every product.  Customers are able to improve engineering efficiency through implementing comprehensive IP Reuse and hierarchical, top-down design methodologies, decreasing costs, increasing first-sample success rate and reducing the design productivity gap.  For more information on ENOVIA Synchronicity DesignSync and other ENOVIA solutions for the semiconductor industry, please visit the company’s Web site.

Gantry’s research also revealed that DesignSync is helping customers define exactly what their product release management process is. It is also seen by these customers as an invaluable tool for:

  • maintaining a competitive advantage;
  • enabling the increased use of hierarchical design and re-use of IP;
  • cost control and risk management;
  • multi-site design management and collaboration;
  • improving time-to-market; and
  • improving customer satisfaction.

“Gantry Group believes that the ENOVIA Synchronicity DesignSync Data Manager can directly assist in controlling costs and serve as a critical technology component for electronics companies seeking to differentiate further from the competition,” said Dawna Paton, managing partner, Gantry. “ENOVIA Synchronicity DesignSync Data Manager is considered the foundational infrastructure for new design workflow best practices and while not specifically quantified, all those surveyed were confident they received a strong positive return on investment.” 

For additional information, follow this link to an archived Webinar where Gantry and ENOVIA discuss the research and its findings—or, to obtain a full copy of the research report, please go to download report.