ENOVIA® - コラボレーティブPLM(プロダクト・ライフサイクル・マネージメント)

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Engineer / Designer

Tools for designers, product engineers, manufacturing professionals and other innovators collaborating on product development. If you are responsible for rapid authoring, analysis and validation of products and processes, then click here to find how ENOVIA can help.

ENOVIA VPM Interference Check

ENOVIA® VPM Interference Check helps companies increase product design quality by enabling designers to detect product interferences and correct errors earlier in the product-development process.

One of the biggest product development challenges for companies that design complex, multi-part products with large volumes of data is discovering design errors earlier in the product-development process. Companies typically conduct regular design interference checks, but these can be time-consuming and resource-intensive and often provide no formal or standard process for design review and validation. The result is that too many design errors are discovered late in the product-development process. This imposes significant risks such as spending critical time building a digital mockup environment without the assurance that designers are using the most up-to-date data. Additionally, this impedes the ability for companies to make intelligent design and development decisions and to execute and follow up on design changes.

Companies need a way to improve their product quality by systematically reducing the impact of design errors through an efficient, formalized interference-detection process so that they can more quickly develop a digital mockup with minimal errors. By implementing ENOVIA VPM Interference Check, companies can have an end-to-end interference detection process that allows designers to interactively detect errors and check the consistency of their design while staying in their authoring environment (CATIA® and DELMIA®). This increases upfront design verifications and improves product quality. ENOVIA VPM Interference Check also enables product synthesis experts to detect, track, and manage interferences on a whole digital mockup, ensuring improved design quality and better time and cost control.

ENOVIA VPM Interference Check provides automatic, upfront design validations before the product gets too complex or before reaching critical milestone reviews. Designers select the products to be analyzed and the type of computation to perform (such as clearance, contact and clash). Specifications and results can be stored for future analysis, which optimizes the product propagation process. The net result is more efficient interference detection, with improved design validation.

 

When used in conjunction with ENOVIA® VPM Interference Management for large mockup analysis, these two products provide a best-in-class solution for more effective error-retrieval, analysis, and correction tracking.

  • Find, understand, retrieve, and correct interference issues more effectively and efficiently
  • Improve design quality by discovering issues earlier in the development process
  • Optimize validation processes by storing specifications and results for future use
  • Enhance productivity by enabling designers to check design consistency while staying in the same authoring environment Enhance productivity by enabling designers to check design consistency while staying in the same authoring environment
  • Detect Interferences Interactively
    Users can define the specifications of the interferences computation that they want to perform by selecting different options including clearance, contact, and clash. The validation process is optimized because specifications and results can be stored for future reuse. Designers can better understand issues and apply the correct modifications using the post-computation analysis tools.
  • Increases Upfront Design Verification for Improved Product Quality
    Product complexity often implies that the time and costs involved to perform the design modifications is important. ENOVIA VPM Interference Check contributes to the continuous improvements manufacturers seek by enabling designers to release error-free designs.
  • Contribute to an End-to-End Interferences Detection Process
    In a formal design review and validation process, product synthesis experts use ENOVIA VPM Interference Management to detect interferences on complex and large digital mockups. The different errors found are assigned to teams and designers for further analysis and modifications. In this context, ENOVIA VPM Interference Check is the key application for designers to understand, retrieve, and correct errors that have been detected.
  • R.A.C.E. Compliancy
    When ENOVIA VPM Interference Check is deployed along with ENOVIA® VPM Team Central™ or ENOVIA VPM Central using the available ENOVIA Rapid Application Configuration Environment (R.A.C.E.), the applications can be used immediately in production. This eliminates the need for specific customizations and reduces the time and effort for enterprise deployments. For more details on the RACE, please refer to the ENOVIA® VPM Central Business Fact Sheet.
  • The Role of ENOVIA V6 and PLM 2.0
    ENOVIA VPM Interference Check supports PLM 2.0, product lifecycle management online for everyone, and the ENOVIA V6 values, which are: • Global collaborative innovation • Single PLM platform for intellectual property (IP) management • Online creation and collaboration • Ready to use PLM business processes • Lower cost of ownership.